Parole chiave e temi trattati:

Controllo di processi, predictive maintenance, carte di controllo, ottimizzazione di mappe di campionamento per il monitoraggio della produzione di semiconduttori, spatial process capability.

Pubblicazioni selezionate:

Borgoni, R., Galimberti, C., Zappa, D. (2021) Identification of spatial defects in semiconductor manufacturing. Applied Stochastic Models In Business and Industry 37(5) 878-893.

Borgoni, R., Zappa, D. (2020) Model-based process capability indices: The dry-etching semiconductor case study, Quality and Reliability Engineering International, 2020/36 (7): 2309-2321.

Deldossi, L., Zappa, D. (2014), A novel approach to evaluate Repeatability and Reproducibility for ordinal data, Communications in Statistics - Theory and Methods,  43, 851-866, ISSN: 0361-0926 print/1532-415X online, DOI: 10.1080/03610926.2013.823208

Facchinetti S., Osmetti S.A., Magagnoli U. (2021): Inferential aspects for the optimal selection of the control parameters in Taguchi method, Applied Stochastic Models in Business and Industry, 37: 859–877.